Plasma Cleaning


  • RF plasma cleaner that reduces hydrocarbon contamination in vacuum chambers.
  • Significantly improves electron microscope imaging and analytical performance.
  • Can also be used as an in-situ solution for cleaning EUV and X-ray optics as well as SEM and TEM samples.
  • Can be installed on most vacuum chambers and electron microscopes.
  • Controllers in rack mounted or tabletop configurations are available.


  • Hydrocarbon removal in high vacuum chambers
  • Clean SEMs and FIBs for better imaging
  • Improve resolution contrast and scanning time
  • Achieve pristine vacuum conditions
  • Prepare specimens for artifact-free imaging

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