The SuPro S20 HV Ion Sputter Coater is a high-vacuum sputtering system designed for FE-SEM sample preparation, ensuring uniform conductive coatings with dual-target magnetron sputtering technology.
Key Features of SuPro S20 HV Ion Sputter Coater:
Advanced Sputtering Technology
- Utilizes dual-target magnetron sputtering, allowing precise deposition of gold, platinum, and alloy films. Unlike conventional sputtering systems, it eliminates the need for frequent target changes, streamlining the coating process while maintaining consistency.
Optimized for FE-SEM Sample Preparation
- High-resolution FE-SEM imaging demands superior sample conductivity and contrast. Ensures dead-corner-free coating, making it ideal for 3D powders, porous materials, and delicate specimens. Its rotary-tilting sample stage enhances uniformity, ensuring complete coverage even on complex surfaces.
High-Vacuum System for Maximum Efficiency
- Achieving a clean vacuum below 10⁻³ Pa, the Ion Sputter Coater minimizes contamination, ensuring precise and reliable sputtering. Equipped with a turbo molecular pump and oil-free diaphragm pump, it maintains optimal conditions for high-quality thin film deposition.
User-Friendly Touchscreen Control
- Operating the SuPro S20 HV is effortless, thanks to its intuitive touchscreen interface. Users can easily adjust coating parameters, monitor processing efficiency, and ensure repeatable results with minimal effort.
Precision and Reliability for Research Applications
- Designed for high-performance sputtering, the SuPro S20 HV delivers consistent and uniform metal deposition, making it an essential tool for laboratories working with FE-SEM sample preparation. Its advanced sputtering technology ensures high-quality coatings, improving imaging contrast and conductivity for accurate analysis.
With advanced sputtering technology, multi-metal adaptability, and high-vacuum efficiency, the SuPro S20 HV Ion Sputter Coater ensures uniform and precise film deposition for FE-SEM sample preparation. Its dual-target magnetron sputtering system enhances coating consistency, while the rotary-tilting sample stage eliminates dead corners, making it ideal for complex 3D structures. Designed for efficiency and accuracy, this sputtering system delivers high-quality conductive coatings, ensuring optimal sample conductivity and imaging contrast
