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HomeMicroscopyElectron MicroscopyFE-SEM HITACHI SU7000 Ultra-High-Resolution Schottky SEM
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HITACHI SU5000 Schottky FE-SEM
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HITACHI Regulus Series Ultra-High Resolution SEM

HITACHI SU7000 Ultra-High-Resolution Schottky SEM

  • High performance, with multiple functionalities,
    including:
    – wide-area observation
    – in-situ analysis
    – variable pressure
    – high-resolution imaging at low accelerating voltages
    – simultaneous multi-signal collection
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  • Description
Description

Features:

  • Versatile Imaging Capability
    – Fast acquisition of multiple signals to address expansive SEM needs, from imaging a wide field of view to visualizing sub-nanometer structures and everything in between
    – Newly designed electron optics and detection systems, allows for efficient simultaneous acquisition of multiple secondary electron and back-scattered electron signals
  • Multi-Channel Imaging
    – Capable of processing, displaying, and saving up to 6 signals simultaneously to maximize information acquisition
  • Wide Variety of Observation Techniques
    – Specimen chamber and the vacuum system are optimized for:
    ・Large specimen size
    ・Sample manipulation at various axes
    ・Variable pressure conditions
    ・Cryogenic conditions
    ・Heating and cooling in-situ observation
  • Microanalysis
    – Schottky emitter electron gun, provides up to 200 nA beam current, for various microanalysis applications
    – Design to incorporate multiple analytical options including EDX, WDX, EBSD, cathodoluminescence, and more
  • Enhanced Information Acquisition
  • Acquisition of structural, topographical, compositional, crystallographic, and other types of information, by minimizing changes to microscope conditions, such as working distance or accelerating voltage
  • Single-Scan Multi-Signal Imaging
  • Simultaneous image acquisition for surface micro-structural information (UD), surface coating (MD), and overall topographic information (LD)
  • Intuitive graphical user interface
  • Enhance signal display
  • Highly flexible screen layout
  • Dual monitor
  • Expandable observation and analysis
  • Large specimen chamber and large stage
    – Optional Camera Navigation
    – Various detectors enabling dynamic observation
    – Detector selection under low vacuum conditions
    – Improved PD-BSED response speed

Application

Specimen: Fiber with metallic oxide
Detector Selection Under Low-Vacuum Conditions
UVD (SE image)
The oxide dispersion and fiber layering state are observed respectively.

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Quasi-S Pte Ltd
(HQ)

35 Marsiling Industrial Estate Road 3 #04-03, Singapore 739257.

T (65) 6383 4386
F (65) 6383 3071
E contact@quasi-s.com.sg

Quasi-S Technology Sdn Bhd
(Bangi Branch)

Block Stroma B3-1, UKM-MTDC Smart Technology Centre 43600 Bangi, Selangor, Malaysia

T (603) 8920 2570
F (603) 8920 2506
E inquiry@quasi-s.com.my

Quasi-S Sdn Bhd
(Penang Branch)

15-G-26 Bayan Point Medan Kampung Relau 11900 Penang, Malaysia

T (604) 645 6973
F (60) 4645 6573
E inquiry@quasi-s.com.my

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