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HomeMicroscopyElectron MicroscopyFIB HITACHI NX9000 Real-Time 3D Analytical FIB-SEM
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HITACHI NX2000 Focused Ion And Electron Beam System And Triple Beam System
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HITACHI Ethos NX5000 Focused Ion And Electron Beam System

HITACHI NX9000 Real-Time 3D Analytical FIB-SEM

  • Incorporates optimized layout for true high-resolution serial sectioning to tackle the latest demands in 3D structural analysis and for TEM and 3DAP analyses
  • Allows the highest precision in material processing for a wide range of areas relating to advanced materials, electronic devices, biological tissues, and a multitude of other applications
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  • Description
Description

Features:

  • The SEM column and FIB column are orthogonally arranged to optimize the column positioning for 3D structural analysis
  • The combination of high-brightness cold-field-emission electron source and high-sensitivity optics support analysis of a wide range of materials from biological tissues to magnetic materials
  • The Micro-sampling system and Triple Beam system allow high-quality sample preparation for TEM and atom-probe applications
  • Ion milling and observation at normal incidence in real-time for true analytical imaging
  • Optional Cut & See, 3D-EDS, 3D-EBSD available for a wide variety of materials

Application

Specimen: 14 nm SoC device

Final milling: 1 kV Ar

Observation: HF-3300 Cold FE-TEM (Accelerating voltage: 300 kV)

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Quasi-S Pte Ltd
(HQ)

35 Marsiling Industrial Estate Road 3 #04-03, Singapore 739257.

T (65) 6383 4386
F (65) 6383 3071
E contact@quasi-s.com.sg

Quasi-S Technology Sdn Bhd
(Bangi Branch)

Block Stroma B3-1, UKM-MTDC Smart Technology Centre 43600 Bangi, Selangor, Malaysia

T (603) 8920 2570
F (603) 8920 2506
E inquirybangi@quasi-s.com.my

Quasi-S Sdn Bhd
(Penang Branch)

15-G-26 Bayan Point Medan Kampung Relau 11900 Penang, Malaysia

T (604) 645 6973
F (60) 4645 6573
E inquiry@quasi-s.com.my

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