Additional features : Additional features :
Dual Gun Baking system
Heatable Movable Aperture
Super ExB filter
TMP
Standard features 1. Ultra-high resolution imaging.
2. 200mm specimen diameter.
3. 5 axis motorized eucentric stage.
4. New super ExB filter technology.
5. Advanced dry vacuum system.
6. 1.4nm at 1kV with beam deceleration
The S-4800 is a truly versatile platform boasting impressive high resolution performance, promising guaranteed secondary electron image resolution of 1.0nm. The patented Dual Gun Baking System, Heatable movable aperture, Super EXB filter and TMP evacuation system add to the extensive capabilities of the S-4800.
The S-4800 compliments the field proven performance and reliability of the
S-4700 and S-5200 Field Emission SEMs. It employs a semi-in-lens detector design for large sample accommodation while achieving ultra-high resolution at low accelerating voltages.
A new objective lens design with Hitachi's patented Super ExB filter technology collects and separates the various components of pure SE, compositional SE and BSE electron signals. The S-4800 can be fully integrated with many optional accessories including Energy Dispersive X-ray Spectrometer (EDX) and Electron Backscatterted Diffraction Pattern (EBDP) systems.
A new GUI design developed in consultation with users make the S-4800 the most advanced, user friendly SEM available today. It is ideal for ultra-high resolution applications such as semiconductor, materials studies and nanotechnology. From precision crafted electron optics to rigid vibration resistant mechanics, from a unique detection system to a user-interface designed to make electron microscopy as effortless as possible, the S-4800 was built to fit requirements.
