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S-4300SE/N

 Resolution :
 1.5nm @ 15kV
 5.0 nm @ 1kv
 Stage :
 3 kinds of selectable stage
 Sample Size :
 160 mm diameter
 Magnification :
 x20~x500,000
 Additional features :
 Dual Gun Baking system
 Heatable Movable Aperture
 Variable pressure mode
 TMP evacuation system

Standard features
1. Large sample chamber with variable pressure 10 ~ 1000Pa.

2. Environmental Secondary Electron Detector (ESED) is available as an option for
    VP (variable pressure) mode.

3. High Resolution Observation of water containing (wet) samples which have
    been challenging for conventional SEMs.

4. High resolution microscopy of electronic materials without sample-coating. The
    VP (variable pressure) mode is useful for microscopy of charge-sensitive     samples.

   The S-4300SE/N is known for its exceptional performance, while its advanced    features and capabilities enable a variety of applications to be imaged quickly and    effortlessly. The S-4300SE/N gives guaranteed secondary electron image    resolution of 1.5nm and image resolution of 3.5nm.

   The S-4300SE/N combines the benefits of a Schottky Field Emission gun, Variable    Pressure technology and Hitachi’s ESED imaging capability. When operating in    Variable Pressure mode, the S-4300SE/N provides high-resolution images of all    types of insulating materials or biological samples.

   The S-4300SE/N’s optional chamber design provides a superior analytical    configuration to optimize the performance of CL, EDX, WDS, and EBSD    applications. High current and stability make the S-4300SE/N ideal for Electron    Beam Lithography and other dynamic experiments.


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