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S-3400N

 

 Resolution :
 3.0 nm @ 25kV, High Vacuum mode
 4.0 nm@25kV,Variable pressure mode
 Stage :
 2 kinds of selectable stage
 Sample Size :
 200 mm diameter
 Additional features :
 Quadrant Gun Bias
 Long Liner Tube design,
 TMP evacuation system

Standard features
1. Revolutionary automatic axis-alignment functions.

2. Even better resolution of 10nm at 3kV.

3. Real time, dual image display and signal mixing.

4. 5-axis motorized stage with high tilt (-20~+90deg.),a tall sample up to 80mm     high applicable.

5. Analytical specimen chamber with optimum geometry for simultaneous    accommodation with EDS, WDS and EBSD.

6. Saving floor space and electric power consumption due to TMP evacuation     system.

   The S-3400N is a High performance, user friendly Scanning electron microscope    with excellent scanning electron and backscattered electron resolution.  SEM
   S-3400N gives guaranteed secondary electron image resolution of 3.0nm and BSE    image resolution of 4.0nm.

   The S-3400N offers advances in automation including full filament saturation and    “no touch” objective aperture alignment. A new analytical chamber provides a    total of ten ports with three high take off angle ports for EDS, Full Focusing WDS,    PBS, EBSD, and XRF. A new high speed, solid state detector allows TV rate    scanning and high resolution imaging.

   Hitachi’s patented Quad variable gun bias and SE accelerator plate ensures high    currents for low voltage applications now approaching Field Emission    performance. These add to the superior capabilities of the S-3400N providing    exceptional micrographs.

 

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