The S-4300 continues the Hitachi tradition of setting the standard for high resolution imaging as well as unparalled uptime. Over 25 years of cold cathode field emission design experience has been incorporated into a robust imaging and analytical tool that can be utilized by SEM users of all skill levels. The S-4300’s chamber design enhances versatility of the SEM by the addition of a variety of accessories such as a cryogenic stage or an EBIC imaging system. In short, the S-4300 CFE SEM provides the user with powerful imaging and analytical capabilities in one easy to use low cost package.

Hitachi's SU6600 is a new and versatile Field Emission SEM for a diversified range of applications including observations and analysis of advanced materials which have become increasingly important for modern science and engineering.
 

It utilizes advanced Variable Pressure (VP) technology and an improved Schottky field emission electron source that provides exceptional imaging and high probe current with great stability.
 

The SU6600 allows accommodation of EDX, WDX, EBSP, CL, Cooling & Cryo etc systems for versatile material analyseis in addition to high resolution imaging and materials characterization.

We are proud to present our NEW versatile solution for analytical purposes in combination with Ultra-High-Resolution and ample Signal Selection capabilities.

The SU-70 combines two electron-optical modes in one instrument: Hitachi's famous semi-inlens optics with ExB signal filtering & detection, and a field-free mode with no magnetic field between sample and objective lens. In both modes the system delivers breath-taking probe currents up to 200nA and an impressing Low kV-resolution for upcoming conceptual formulations.
 

Get convinced by this performance regarding to our Hitachi "semi-in-lens"-concept and the Field-Emission-Schottky-Gun. Take advantage of this uncompromising Scanning Electron Microscope (SEM).

The Hitachi S-4800 is a truly versatile platform comprising impressive high resolution performance, advanced detection technology, and a user interface that makes it possible to capture even the most short lived moments accurately and clearly.
 

It employs a semi-in-lens design for large sample accommodation while achieving ultra-high resolution comparable to performance only available with in-lens UHR SEMs.

The new SU8000 is ideally suited to imaging of new and innovative nanotechnology materials and features a triple detection system along with a semi-in-lens type of objective lens to maximize surface and sub-surface information provided by the secondary and backscattered electron signals.
 

A new top detector is a further advance on the popular upper backscattered electron detector used in the S-5500. By combining the top detector with the proven upper detector with ExB filter technology, Hitachi has now developed a new signal detection system for optimum contrast visualization of signals, generated from the sample especially under low-accelerating voltage conditions best suited for observation of nanomaterials. These signals include secondary electrons, low-angle backscattered electrons and high-angle backscattered electrons, which are acquired for observation of surface structures.

 
 

The Hitachi SU8000 includes an Upper detector, which provides highly efficient SE signal detection employing Hitachi’s proprietary and popular ExB filter technology. This capability provides high-resolution top surface structure imaging, while charging is controlled by varying the ratio of secondary and backscattered electron signal collection.
 

The upper image example on the right shows the surface of a blue-ray DVD, recorded at 1kV accelerating voltage with the upper detector of the SU8000. The pure SE signal represents exclusively top surface topographical information.
 

The new Top detector can detect high-angle backscattered electrons at low accelerating voltages. This imaging component represents pure channeling and compositional contrast of the sample without surface-topographical artifacts. This is shown in the lower image on the right, showing the same blue-ray DVD position but now imaged with the Top detector.

With Hitachi’s beam deceleration technology and the use of the top detector, high-resolution observations can be performed at ultra-low landing voltages. The top detector now captures the accelerated secondary electron signals (left picture in example below), while the upper detector receives backscattered signal (right picture below). This new combination allows surface information never seen before to be visualized at accelerating voltages as low as 100V.

The SU8000 detection system can be optionally further expanded by an annular semiconductor-type BSE detector, mounted below the SEM objective lens. This penta-device detector (PD-BSE detector) features 4+1 independent segments, allowing flexible comination and subtraction of each segment's signal for optimized visualization of angle-dependent backscattered electron information, e.g. from nanocrystaline samples.

The Hitachi S-5500 In-lens FE-SEM is a dedicated ultra-high resolution FE-SEM for the advancement of leading edge research and development of nanotechnologies. Our patented in-lens technology provides the ultimate performance of imaging resolution and EDX analysis.

An astonishing resolution of 1.6nm at 1kV and 0.4nm at 30kV are guaranteed onsite. Building upon the mechanical stability of the S-5200, the S-5500 is equipped with a shielding system for reduced EMI and acoustic interferences. These improvements in conjunction with a completely dry vacuum system assure our high-resolution guarantee for the life of the instrument.
 

Extending the capabilities of the S-5500 is its EDS solid angle of 0.15 or greater and newly designed BF/DF Duo-STEM detector (patent pending). This innovative STEM system contains an adjustable dark field detector for tunable collection angles. Sometimes a single image can change the way we look at life. The new S-5500 with its advancements in information collection will lead you to those opportunities.