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BEST EQ
Focus Ion Beam System (FIB)
FA 2000 Plasma Solutions For Failure Analysis
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User Friendly Interface
TFT display and an alpha-numeric IR keyboard with pointer. In addition there are eight process step buttons for even more ease of use.
All parameters and setpoints are visible simultaneously.
Software revisions or added features can be downloaded from our website and transferred to the tool via floppy disk.
System status, unlimited process storage and onscreen process notes are standard features!!!
Upgradeable to data logging and Ethernet!!!
Superior Chamber Design with Features Normally not seen in Table Top Systems!!!
Quad Input manifold provides uniform conductance of process gases and high etch uniformity on wafers.
Operation within a wide pressure band enables fast isotropic etching at higher pressures and exceptionally.
Operation within a temperature range from 0-125 degrees C enhances etch rates for decap application.
Reactor design provides higher aspect ratios and better etches profiles with standard rotary vane vacuum systems.
Mechanical design allows for flexibility with addition of options such as fillerblast and I.C.P.
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