Kurt J. Lesker ALD150LX – Plasma Enhanced Atomic Layer Deposition System, Up to 150mm Substrates

Kurt J. Lesker ALD150LX – Plasma Enhanced Atomic Layer Deposition System, Up to 150mm Substrates

  • Designed with patented precursor focusing technology resulting in best precursor utilization, high mean time between service intervals or high throughput
  • Competes with all metal seal reactors while maintaining ease of service
  • Operational modes: static mode, dynamic mode, plasma enhanced, variable residence time mode
  • Source design solutions for the most difficult to deliver precursors
  • 2 precursor lines standard, optional 19 lines available
  • Remote plasma source option with up to 6 plasma lines, reactant bypass network, optional gas compatibility PLC
  • In-Situ ellipsometer ports standard
  • 500°C substrate heater
  • Ozone optional
  • True ALD valve precision timing that supports further precursor utilization
  • KJLC ALD eKLipse™ software capable of the most complex super cycle depositions
  • Can integrate with KJLC cluster system for multi deposition technique capability or In-Situ XPS
  • Glovebox connection optional

Product Description

  • Designed with patented precursor focusing technology resulting in best precursor utilization, high mean time between service intervals or high throughput
  • Competes with all metal seal reactors while maintaining ease of service
  • Operational modes: static mode, dynamic mode, plasma enhanced, variable residence time mode
  • Source design solutions for the most difficult to deliver precursors
  • 2 precursor lines standard, optional 19 lines available
  • Remote plasma source option with up to 6 plasma lines, reactant bypass network, optional gas compatibility PLC
  • In-Situ ellipsometer ports standard
  • 500°C substrate heater
  • Ozone optional
  • True ALD valve precision timing that supports further precursor utilization
  • KJLC ALD eKLipse™ software capable of the most complex super cycle depositions
  • Can integrate with KJLC cluster system for multi deposition technique capability or In-Situ XPS
  • Glovebox connection optional

Additional Information

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