Defect Analysis SEM/EDX Field Emission SEM (FESEM)
Analytical Variable Pressure FE-SEM SU6600
Maximum versatility: Analysis and Imaging at its best.

Hitachi's SU6600 is a new and versatile Field Emission SEM for a diversified range of applications including observations and analysis of advanced materials which have become increasingly important for modern science and engineering.pro66.jpg
It utilizes advanced Variable Pressure (VP) technology and an improved Schottky field emission electron source that provides exceptional imaging and high probe current with great stability.
The SU6600 allows accommodation of EDX, WDX, EBSP, CL, Cooling & Cryo etc systems for versatile material analyseis in addition to high resolution imaging and materials characterization.

  •  Schottky electron source, up to 200nA probe current
  •  Field-free lens design, suitable for observation of
     magnetic samples and distortion-free EBSD
  •  High Chamber Vacuum mode (10-4 Pa)
  •  Variable Chamber Pressure (VP) mode (10-300Pa)
  •  Automated Differential Aperture (ADAPT) for hands-off
      changeover between VP and High-Vacuum mode by a
      simple mouse-click
  •  Everhart-Thornly Secondary Electron Detector (SED)
      for high-resolution imaging
  •  4+1 Segment Backscatter Electron Detector with live
      stream observation
  •  Environmental SED (ESED-II) for secondary electron
      collection in VP mode (option)
  •  Analytical Specimen Chamber for simultaneous
      attachment of accessories like WDS, EDS, EBSD, CL
  •  Specimen exchange system allows fast exchange
      (pumpdown time < 30s) of samples with sizes of
      150mm diameter and 40mm height.
Ultra-High-Resolution Analytical FE-SEM SU-70

pro66.jpgSophisticated performance in Ultra-High-Resolution and Analysis

We are proud to present our NEW versatile solution for analytical purposes in combination with Ultra-High-Resolution and ample Signal Selection capabilities.

The SU-70 combines two electron-optical modes in one instrument: Hitachi's famous semi-inlens optics with ExB signal filtering & detection, and a field-free mode with no magnetic field between sample and objective lens. In both modes the system delivers breath-taking probe currents up to 200nA and an impressing Low kV-resolution for upcoming conceptual formulations.
Get convinced by this performance regarding to our Hitachi "semi-in-lens"-concept and the Field-Emission-Schottky-Gun. Take advantage of this uncompromising Scanning Electron Microscope (SEM).

The SU-70 invites you to do the next steps in the nanoworld!

The spectacular SU-70 - Features
  •  Schottky Field Emission Source
  •  UHR Ultra-High-Resolution
     1.0 nm / 15 kV (1.6 nm / 1 kV)
  •  Hitachi´s unrivaled Super ExB Filter -
      Sophisticated SE/BSE-signal-detection
  •  FieldFreeMode (FF mode) - observing magnetic
      samples and distortion-free EBSD-analysis
  •  Breath-taking probe current up to 200 nA
  •  Versatile analytic-chamber for multiple,
      simultaneous analysis
  •  Highest Beam Stability

Ultra-High-Resolution CFE-SEM Optimized for Nanostructure Characterization SU8000 

pro66.jpgThe new SU8000 is ideally suited to imaging of new and innovative nanotechnology materials and features a triple detection system along with a semi-in-lens type of objective lens to maximize surface and sub-surface information provided by the secondary and backscattered electron signals.
A new top detector is a further advance on the popular upper backscattered electron detector used in the S-5500. By combining the top detector with the proven upper detector with ExB filter technology, Hitachi has now developed a new signal detection system for optimum contrast visualization of signals, generated from the sample especially under low-accelerating voltage conditions best suited for observation of nanomaterials. These signals include secondary electrons, low-angle backscattered electrons and high-angle backscattered electrons, which are acquired for observation of surface structures.

The Hitachi SU8000 includes an Upper detector, which provides highly efficient SE signal detection employing Hitachi’s proprietary and popular ExB filter technology. This capability provides high-resolution top surface structure imaging, while charging is controlled by varying the ratio of secondary and backscattered electron signal collection.
The upper image example on the right shows the surface of a blue-ray DVD, recorded at 1kV accelerating voltage with the upper detector of the SU8000. The pure SE signal represents exclusively top surface topographical information.
The new Top detector can detect high-angle backscattered electrons at low accelerating voltages. This imaging component represents pure channeling and compositional contrast of the sample without surface-topographical artifacts. This is shown in the lower image on the right, showing the same blue-ray DVD position but now imaged with the Top detector.

With Hitachi’s beam deceleration technology and the use of the top detector, high-resolution observations can be performed at ultra-low landing voltages. The top detector now captures the accelerated secondary electron signals (left picture in example below), while the upper detector receives backscattered signal (right picture below). This new combination allows surface information never seen before to be visualized at accelerating voltages as low as 100V.
The SU8000 detection system can be optionally further expanded by an annular semiconductor-type BSE detector, mounted below the SEM objective lens. This penta-device detector (PD-BSE detector) features 4+1 independent segments, allowing flexible comination and subtraction of each segment's signal for optimized visualization of angle-dependent backscattered electron information, e.g. from nanocrystaline samples.

In addition, SU8000 is equipped with a chamber Everhard-Thornley SE detector, and can optionally also observe transmitted electron signals (DF and BF STEM imaging).

SU8040-Ultra-High-Resolution CFE-SEM with REGULUS high performance stage

SU8040 SEM.jpg
The SU8040 is based on the successful cold-field-emission SEM SU8000 platform and shares especially its triple detection system.

In response to the further growing need of fine surface detail imaging on nanoscale structures, enhancement has been achieved in terms of image resolution at low beam energies, now enabling a SE resolution of 1.3nm at an electron landing energy of 1keV.

SU8040's key highlight is the new high-performance REGULUS sample stage. This new Regulus stage enables smooth navigation even at highest magnifications of several hundred kx with immediate response to trackball or joystick commands and drift-less stopping upon release.
While such fine and precise motion has so far mostly been realized using piezo technology, Hitachi's new Regulus stage has adopted a highly reliable conventional motor drive which guarantees for long-term stable performance.

Taking advantage of the great Regulus stage performance, a cell count assist software is now available as an option.  The cell count assist software continuously recognizes and counts the repeated patterns of DRAM/SRAM samples passing through the actual field-of-view during stage motion. This allows automated identification of patterns for measurement and defect analysis, eliminating tedious manual searching.

In-Lens FE SEM S-5500  
  •  0.4nm resolution at 30kV (Highest SEM
      resolution guarantee in the world)
  •  1.6nm resolution at 1kV
  •  Enormous magnification range
      of 60X – 2,000,000X
  •  Patented SE/BSE detector mode
      for signal mixing
  •  Unique BF/DF Duo-STEM detector
     •  Diverse specimen holders, compatible with FIB and STEM

The Hitachi S-5500 In-lens FE-SEM is a dedicated ultra-high resolution FE-SEM for the advancement of leading edge research and development of nanotechnologies. Our patented in-lens technology provides the ultimate performance of imaging resolution and EDX analysis.

An astonishing resolution of 1.6nm at 1kV and 0.4nm at 30kV are guaranteed onsite. Building upon the mechanical stability of the S-5200, the S-5500 is equipped with a shielding system for reduced EMI and acoustic interferences. These improvements in conjunction with a completely dry vacuum system assure our high-resolution guarantee for the life of the instrument.
Extending the capabilities of the S-5500 is its EDS solid angle of 0.15 or greater and newly designed BF/DF Duo-STEM detector (patent pending). This innovative STEM system contains an adjustable dark field detector for tunable collection angles. Sometimes a single image can change the way we look at life. The new S-5500 with its advancements in information collection will lead you to those opportunities.

   •  The world's highest resolution at 30kV: 0.4nm at 30kV guaranteed,
       1.6nm at 1kV guaranteed
   •  Hitachi's unique variable Super ExB signal mode allows operator
       to optimize secondary and  backscatter signal content of the image.
   •  New BF/DF Duo-STEM detector allows simultaneous display of BF
       and DF images. Variable  detection angle in DF STEM mode (option).
   •  Electron optical design allows EDS analysis and imaging without
       changing specimen position.
   •  FIB compatible holders for seamless imaging of targeted preparation sites (option).